共 18 条
- [1] HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1743 - 1748
- [2] 250-A LINEWIDTHS WITH PMMA ELECTRON RESIST [J]. APPLIED PHYSICS LETTERS, 1978, 33 (05) : 392 - 394
- [3] PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1271 - 1275
- [4] MOLECULAR-PARAMETERS AND LITHOGRAPHIC PERFORMANCE OF POLY(CHLOROMETHYLSTYRENE) - A HIGH-PERFORMANCE NEGATIVE ELECTRON RESIST [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1121 - 1126
- [5] A HIGH-SPEED ELECTRON-BEAM LITHOGRAPHY SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 932 - 935
- [6] Fredericks E. C., 1977, IBM Technical Disclosure Bulletin, V20
- [7] GREENEICH JS, 1980, 9TH P INT C EL ION B, P282
- [8] MUTUAL REPULSION EFFECTS IN A HIGH THROUGHPUT E-BEAM LITHOGRAPHY COLUMN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1106 - 1110
- [10] A HIGH-CURRENT, HIGH-SPEED ELECTRON-BEAM LITHOGRAPHY COLUMN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 936 - 940