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PLASMA DIAGNOSTIC STUDIES FOR REACTIVE ION ETCHING SYSTEMS

被引：5
作者：
ALASSADI, KF
CHATTERTON, PA
REES, JA
机构：
来源：
VACUUM | 1988年 / 38卷 / 8-10期
关键词：
D O I：
10.1016/0042-207X(88)90432-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：633 / 636
页数：4
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