FILM DEPOSITION AND SURFACE MODIFICATION USING INTENSE PULSED ION-BEAMS

被引：33

作者：

MELI, CA ^{[1
]}

GRABOWSKI, KS ^{[1
]}

HINSHELWOOD, DD ^{[1
]}

STEPHANAKIS, SJ ^{[1
]}

REJ, DJ ^{[1
]}

WAGANAAR, WJ ^{[1
]}

机构：

[1] LOS ALAMOS NATL LAB,LOS ALAMOS,NM 87545

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期

关键词：

Film deposition rates - Film-deposition process - Framing photography - High power density - Intense pulsed ion beams - Los Alamos National Laboratory - Naval Research Laboratory - Single crystal substrates;

D O I：

10.1116/1.579858

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1182 / 1187

页数：6

共 12 条

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[2]

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[3]

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[5]

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[7] APPLICATION OF HIGH-POWER ION-BEAMS FOR TECHNOLOGY [J].

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[8]

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[9]

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[10]

STEPHANAKIS SJ, 1992, BEAMS 92, P871

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