CMOS CIRCUITS MADE IN THIN SIMOX FILMS

被引:27
作者
COLINGE, JP
KAMINS, TI
机构
关键词
INTEGRATED CIRCUITS - SEMICONDUCTOR DEVICES; MOS;
D O I
10.1049/el:19870810
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
MOS transistors and ring oscillators have been fabricated in thin (100 nm) SIMOX films. As has been theoretically predicted, no 'kink' effect is observed in the n-channel devices, the inverse subthreshold slope is lower than in bulk devices (70 mv/decade against 110 mv/decade in bulk), and the dependence of threshold voltage on gate length is much less pronounced than in the bulk.
引用
收藏
页码:1162 / 1164
页数:3
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