PHASE-TRANSITIONS IN AMORPHOUS SI PRODUCED BY RAPID HEATING

被引:99
作者
BAERI, P
FOTI, G
POATE, JM
CULLIS, AG
机构
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
[2] ROYAL SIGNALS & RADAR ESTAB,GREAT MALVERN WR14 3PS,WORCESTERSHIRE,ENGLAND
关键词
D O I
10.1103/PhysRevLett.45.2036
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:2036 / 2039
页数:4
相关论文
共 9 条
[1]   ARSENIC DIFFUSION IN SILICON MELTED BY HIGH-POWER NANOSECOND LASER PULSING [J].
BAERI, P ;
CAMPISANO, SU ;
FOTI, G ;
RIMINI, E .
APPLIED PHYSICS LETTERS, 1978, 33 (02) :137-140
[2]   MELTING MODEL FOR PULSING-LASER ANNEALING OF IMPLANTED SEMICONDUCTORS [J].
BAERI, P ;
CAMPISANO, SU ;
FOTI, G ;
RIMINI, E .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :788-797
[3]  
BAGLEY BG, 1978, LASER SOLID INTERACT, P97
[4]   SPECIFIC HEAT AND HEAT OF CRYSTALLIZATION OF AMORPHOUS GERMANIUM [J].
CHEN, HS ;
TURNBULL, D .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (10) :4214-&
[5]   PULSED-ELECTRON-BEAM ANNEALING OF ION-IMPLANTATION DAMAGE [J].
GREENWALD, AC ;
KIRKPATRICK, AR ;
LITTLE, RG ;
MINNUCCI, JA .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :783-787
[6]  
Kodera H., 1963, JAP J APPL PHYS, V2, P212, DOI [10.1143/JJAP.2.212, DOI 10.1143/JJAP.2.212]
[7]  
OLETTE M, 1957, CR HEBD ACAD SCI, V244, P1033
[8]  
SPAEPEN F, 1978, LASER SOLID INTERACT, P73
[9]  
1967, THERMOPHYSICAL PROPE, V1