MEASUREMENT OF ANODIC OXIDE FILM THICKNESS BY ELECTROREFLECTANCE INTERFEROMETRY

被引：13

作者：

HOLDEN, BJ

ULLMAN, FG

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1969年 / 116卷 / 02期

关键词：

D O I：

10.1149/1.2411816

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：280 / &

共 11 条

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PHYSICAL REVIEW, 1967, 154 (03) :696-+

[4]

DUFFY MT, 1968, OPTICAL PROPERTIES D

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DYSON, J .

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[6]

HEAVENS OS, 1965, OPTICAL PROPERTIES T, pCH5

[7] ELLIPSOMETRIC INVESTIGATION OF THE OPTICAL PROPERTIES OF ANODIC OXIDE FILMS ON TANTALUM [J].

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (12) :1411-1416

[8]

ULLMAN FG, 1967, B AM PHYS SOC, V12, P1132

[9] AN ELLIPSOMETRIC STUDY OF STEADY-STATE HIGH FIELD IONIC CONDUCTION IN ANODIC OXIDE FILMS ON TANTALUM NIOBIUM AND SILICON [J].

YOUNG, L ;

ZOBEL, FGR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (03) :277-&

[10] ANODIC OXIDE FILMS ON NIOBIUM - THICKNESS, DIELECTRIC CONSTANT, DISPERSION, REFLECTION MINIMA, FORMATION FIELD STRENGTH, AND SURFACE AREA [J].

YOUNG, L .

CANADIAN JOURNAL OF CHEMISTRY, 1960, 38 (07) :1141-1147

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