JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
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1993年
/
11卷
/
04期
关键词:
D O I:
10.1116/1.578503
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
The yttrium-oxide phase diagram contains only one equilibrium compound, a Y2O3 cubic structure. The process of reactive sputter deposition is used to synthesize previously unreported, yttrium-rich oxide compounds. A planar magnetron is operated in the direct-current mode using a working gas mixture of argon-20% oxygen. For low sputter gas pressure and flow conditions, the yttrium content of the coating is directly controlled as a function of the applied target power, i.e., the deposition rate. The composition and structure of the coatings are characterized using Auger depth profiling and x-ray diffraction. A continuous series of compounds are formed with an orthorhombic crystal structure for concentrations ranging from 40 to 75 at. % yttrium.