THE PREPARATION OF THIN-FILMS BY PHYSICAL VAPOR-DEPOSITION METHODS

被引：212

作者：

REICHELT, K

JIANG, X

机构：

来源：

THIN SOLID FILMS | 1990年 / 191卷 / 01期

关键词：

D O I：

10.1016/0040-6090(90)90277-K

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The preparation of thin films by physical vapour deposition methods is described. At first the different processes for the ejection of particles into vacuum and the characteristic properties of the particles (ionization degree, kinetic energy etc.) are discussed. The influence of the growth parameters on the initial growth and the growth after coalescence is reported. The interrelations are illustrated by experimental findings and computer simulations. © 1990.

引用

页码：91 / 126

页数：36

共 53 条

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