SECONDARY-ELECTRON EMISSION OF METAL-OXIDE SPUTTERED THIN-FILMS

被引：4

作者：

CROITORU, N

SEIDMAN, A

YASSIN, K

机构：

[1] Tel-Aviv University, Ramat-Aviv

来源：

THIN SOLID FILMS | 1990年 / 191卷 / 02期

关键词：

D O I：

10.1016/0040-6090(90)90386-R

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Films of CuxBa1-xO (0 ≤ x ≤ 1) were deposited by r.f. sputtering from targets consisting of mixtures of (Cu2O)y (BaO)1-y powder. It was shown that the rate of deposition (Rd) depends linearly on the target-substrate distance (D), target composition (y) and applied r.f. power. The maximum secondary electron emission yield (δm) and the minimum primary electron energy (Em) are achieved for the same value x = 0.15. The conductivity depends exponentially on x, which shows that copper is a strong source of free carriers in the CuxBa1-xO composition. © 1990.

引用

页码：361 / 367

页数：7

共 9 条

[1] POSSIBLE HIGH-TC SUPERCONDUCTIVITY IN THE BA-LA-CU-O SYSTEM [J].