DEUTERIUM TRAPPING IN HELIUM-IMPLANTED NICKEL

被引：68

作者：

BESENBACHER, F ^{[1
]}

BOTTIGER, J ^{[1
]}

MYERS, SM ^{[1
]}

机构：

[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 05期

关键词：

D O I：

10.1063/1.331133

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：3547 / 3551

页数：5

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