COMPUTER-SIMULATION OF CHEMICALLY DRIVEN GRAIN-GROWTH DURING LIQUID-PHASE SINTERING

被引：12

作者：

NIKOLIC, ZS ^{[1
]}

HUPPMANN, WJ ^{[1
]}

机构：

[1] MAX PLANCK INST MET RES,INST WERKSTOFFWISSENSCH,STUTTGART,FED REP GER

来源：

ACTA METALLURGICA | 1980年 / 28卷 / 04期

关键词：

D O I：

10.1016/0001-6160(80)90137-6

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：475 / 479

页数：5

共 10 条

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[7] SOLUBILITY AND VOLUME DIFFUSION OF NICKEL IN TUNGSTEN AT 1640-DEGREES-C [J].

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[10] CHEMICALLY DRIVEN GROWTH OF TUNGSTEN GRAINS DURING SINTERING IN LIQUID NICKEL [J].

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ACTA METALLURGICA, 1979, 27 (06) :973-977

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