PLASMA-ETCHING OF SI AND SIO2 IN SF6-O2 MIXTURES

被引：263

作者：

DAGOSTINO, R

FLAMM, DL

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 01期

关键词：

D O I：

10.1063/1.328468

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：162 / 167

页数：6

共 58 条

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