MULTILAYER GROWTH-PROCESS OF C-60 ON A SI(111) 7X7 SURFACE

被引:26
作者
SATO, T
SUEYOSHI, T
IWATSUKI, M
机构
[1] JEOL Ltd., Akishima, Tokyo, 196
关键词
D O I
10.1016/0039-6028(94)90017-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Scanning tunneling microscopy has been applied to study the multilayer growth process of C-60 molecules on a si(111)7 x 7 surface. We have observed the local ordering of the first C-60 layer formed on the 7 x 7 structure at room temperature. This local ordering structure is made of distinct double domains in each of which the arrangement direction of C-60 molecules deviates +11 degrees or -11 degrees from the Si[($) over bar 211] direction. This structure coincides with the interfacial structure model proposed by Hang Xu et al. [Phys. Rev. Lett. 70 (1993) 1850]. The island growth of C-60 starts on this local ordering area when the coverage exceeds approximately 1 monolayer.
引用
收藏
页码:L137 / L142
页数:6
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