MULTIPLEXING ELECTRON-BEAM PATTERNS USING SINGLE-CRYSTAL THIN-FILMS

被引：2

作者：

KRAKOW, W

HOWLAND, LA

MCKINLEY, G

机构：

[1] XEROX CORP,ROCHESTER,NY 14644

[2] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

来源：

JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1979年 / 12卷 / 10期

关键词：

D O I：

10.1088/0022-3735/12/10/023

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Describes a beam-multiplexing method which alters the distribution of the electron beam for microwriting using a single-crystal film. Several patterns are addressed simultaneously using diffracted beams. The technique can be incorporated either into a scanning system to increase further the speed of writing or into projection systems to simplify the complex nature of thin-foil masks. A number of fundamental experiments have been performed using both transmission and scanning electron microscopes to demonstrate the versatility and limitations of the technique.

引用

页码：984 / 988

页数：5