EFFECT OF ELECTROSTATIC SCREENING ON ENERGY POSITIONS OF ELECTRON-SPECTRA NEAR SIO2/SI INTERFACES

被引：49

作者：

BROWNING, R ^{[1
]}

SOBOLEWSKI, MA ^{[1
]}

HELMS, CR ^{[1
]}

机构：

[1] STANFORD UNIV,DEPT ELECT ENGN,STANFORD ELECTR LAB,STANFORD,CA 94305

来源：

PHYSICAL REVIEW B | 1988年 / 38卷 / 18期

关键词：

D O I：

10.1103/PhysRevB.38.13407

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：13407 / 13410

页数：4

共 11 条

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