ELECTRON-SPECTROSCOPY STUDY OF THE SI-O BONDING AND THE POLARIZATION SCREENING NEAR THE SI-SIO2 INTERFACE

被引：30

作者：

IQBAL, A ^{[1
]}

BATES, CW ^{[1
]}

ALLEN, JW ^{[1
]}

机构：

[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

来源：

APPLIED PHYSICS LETTERS | 1985年 / 47卷 / 10期

关键词：

D O I：

10.1063/1.96380

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1064 / 1066

页数：3

共 13 条

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