SPUTTERING MECHANISM FOR LOW-ENERGY LIGHT-IONS

被引:75
作者
BEHRISCH, R [1 ]
MADERLECHNER, G [1 ]
SCHERZER, BMU [1 ]
ROBINSON, MT [1 ]
机构
[1] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37830
来源
APPLIED PHYSICS | 1979年 / 18卷 / 04期
关键词
61.80; 79.20;
D O I
10.1007/BF00899693
中图分类号
O59 [应用物理学];
学科分类号
摘要
The computer simulation program MARLOWE which follows the trajectories of energetic ions and recoiling target atoms in solids has been used to calculate sputtering yields for low energy (0.1-10keV) light ions (H, D, T,4He). Recoil energy densities were calculated for comparison with analytical theories. The sputtering yields obtained for amorphous Fe agree within a factor of two with experimentally measured values for polycrystalline stainless steel, while the calculated yields for protons on amorphous molybdenum are more than twice the experimental values on polycrystalline material. The calculations show that in the parameter range investigated, ions backscattered in the solid contribute a major part to sputtering. This result confirms earlier calculations of the threshold energy for sputtering which are in agreement with recent measurements. © 1979 Springer-Verlag.
引用
收藏
页码:391 / 398
页数:8
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