EFFECT OF OXYGEN ON FORMATION OF GERMANIUM FILMS

[1] ADAMSKY RF, TO BE PUBLISHED

[2] THE EFFECT OF VACUUM-EVAPORATION PARAMETERS ON THE STRUCTURAL, ELECTRICAL AND OPTICAL PROPERTIES OF THIN GERMANIUM FILMS [J]. SOLID-STATE ELECTRONICS, 1963, 6 (03) : 205 - &

[3] EPITAXY OF GERMANIUM FILMS ON GERMANIUM BY VACUUM EVAPORATION [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (03) : 1015 - &

[4] EPITAXIAL DEPOSITION OF GERMANIUM BY BOTH SPUTTERING AND EVAPORATION [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (10) : 3665 - +

[5] LAW ST, 1957, J ELECTROCHEM SOC, V104, P154

[6] MAGSTRUM HD, 1961, J APPL PHYS, V32, P1020

[7] THERMAL RESTORATION OF OXYGENATED GERMANIUM SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1958, 29 (05) : 771 - 775

[8] SLOOPE BW, 1963, J APPL PHYS, V36, P3174

[1] ADAMSKY RF, TO BE PUBLISHED

[2] THE EFFECT OF VACUUM-EVAPORATION PARAMETERS ON THE STRUCTURAL, ELECTRICAL AND OPTICAL PROPERTIES OF THIN GERMANIUM FILMS [J]. SOLID-STATE ELECTRONICS, 1963, 6 (03) : 205 - &

[3] EPITAXY OF GERMANIUM FILMS ON GERMANIUM BY VACUUM EVAPORATION [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (03) : 1015 - &

[4] EPITAXIAL DEPOSITION OF GERMANIUM BY BOTH SPUTTERING AND EVAPORATION [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (10) : 3665 - +

[5] LAW ST, 1957, J ELECTROCHEM SOC, V104, P154

[6] MAGSTRUM HD, 1961, J APPL PHYS, V32, P1020

[7] THERMAL RESTORATION OF OXYGENATED GERMANIUM SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1958, 29 (05) : 771 - 775

[8] SLOOPE BW, 1963, J APPL PHYS, V36, P3174