A MODEL OF SIPOS DEPOSITION BASED ON INFRARED SPECTROSCOPIC ANALYSIS

被引：30

作者：

KNOLLE, WR

MAXWELL, HR

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 10期

关键词：

D O I：

10.1149/1.2129387

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2254 / 2259

页数：6

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