STABILITY OF CARBON AND BERYLLIUM-DOPED BASE GAAS/ALGAAS HETEROJUNCTION BIPOLAR-TRANSISTORS

被引:71
作者
REN, F
FULLOWAN, TR
LOTHIAN, J
WISK, PW
ABERNATHY, CR
KOPF, RF
EMERSON, AB
DOWNEY, SW
PEARTON, SJ
机构
关键词
D O I
10.1063/1.105623
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaAs/AlGaAs heterojunction bipolar transitors (HBTs) utilizing highly Be-doped base layers display a rapid degradation of dc current gain and junction ideality factors during bias application at elevated temperature. For example, the gain of a 2 X 10-mu-m2 device with a 4 X 10(19) cm-3 Be-doped base layer operated at 200-degrees-C with a collector current of 2.5 X 10(4) A cm-2 falls from 16 to 1.5 within 2 h. Both the base emitter and base collector junction ideality factors also rise rapidly during device operation, and this current-induced degradation is consistent with recombination-enhanced diffusion of Be interstitials producing graded junctions. By sharp contrast, devices with highly C-doped (p = 7 X 10(19) cm-3) base layers operated under the same conditions show no measurable degradation over much longer periods (12 h). This high degree of stability is most likely a result of the fact that C occupies the As sublattice, rather than the Ga sublattice as in the case of Be, and also has a higher solubility than Be. The effect of nearby implant isolated regions in promoting Be diffusion is also reported.
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页码:3613 / 3615
页数:3
相关论文
共 11 条
[1]  
ASBECK PM, 1990, HIGH SPEED SEMICONDU, pCH6
[2]   A MONTE-CARLO COMPUTER-PROGRAM FOR THE TRANSPORT OF ENERGETIC IONS IN AMORPHOUS TARGETS [J].
BIERSACK, JP ;
HAGGMARK, LG .
NUCLEAR INSTRUMENTS & METHODS, 1980, 174 (1-2) :257-269
[3]   RESONANCE IONIZATION MASS-SPECTROMETRY OF ALXGA1-XAS - DEPTH RESOLUTION, SENSITIVITY, AND MATRIX EFFECTS [J].
DOWNEY, SW ;
KOPF, RF ;
SCHUBERT, EF ;
KUO, JM .
APPLIED OPTICS, 1990, 29 (33) :4938-4942
[4]   GROWTH AND DIFFUSION OF ABRUPT ZINC PROFILES IN GALLIUM-ARSENIDE AND HETEROJUNCTION BIPOLAR-TRANSISTOR STRUCTURES GROWN BY ORGANOMETALLIC VAPOR-PHASE EPITAXY [J].
ENQUIST, P ;
HUTCHBY, JA ;
DELYON, TJ .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (09) :4485-4493
[5]  
Hafizi M. E., 1990, 12th Annual GaAs IC Symposium. Technical Digest 1990 (Cat. No.90CH2889-4), P329, DOI 10.1109/GAAS.1990.175521
[6]   REDISTRIBUTION OF ZN IN GAAS-ALGAAS HETEROJUNCTION BIPOLAR-TRANSISTOR STRUCTURES [J].
HOBSON, WS ;
PEARTON, SJ ;
JORDAN, AS .
APPLIED PHYSICS LETTERS, 1990, 56 (13) :1251-1253
[7]  
HOFLER GE, 1991, FAL MAT RES SOC C BO, P46
[8]  
Nakajima O., 1990, International Electron Devices Meeting 1990. Technical Digest (Cat. No.90CH2865-4), P673, DOI 10.1109/IEDM.1990.237110
[9]   IMPLANT ISOLATION OF GAAS-ALGAAS HETEROJUNCTION BIPOLAR-TRANSISTOR STRUCTURES [J].
REN, F ;
PEARTON, SJ ;
HOBSON, WS ;
FULLOWAN, IR ;
LOTHIAN, J ;
YANOF, AW .
APPLIED PHYSICS LETTERS, 1990, 56 (09) :860-862
[10]  
REN F, 1991, ELECTRON LETT, V27, P1009