SPUTTERING TARGET FOR PRODUCTION OF CONICR/CR SPUTTERED HARD DISK

被引:4
作者
YAMADA, T
HIGUCHI, Y
TANI, N
ISHIKAWA, M
OTA, Y
NAKAMURA, K
ITOH, A
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词
D O I
10.1116/1.574895
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1971 / 1974
页数:4
相关论文
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