DEPTH PROFILING OF ION-IMPLANTED ALLOYS

被引：7

作者：

CAMPBNELL, AB

SARTWELL, BD

NEEDHAM, PB

机构：

[1] BUR MINES,AVONDALE,MD 20782

[2] BUR MINES,WASHINGTON,DC 20241

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 01期

关键词：

D O I：

10.1063/1.327367

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：283 / 289

页数：7

共 32 条

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LEVER, RF .

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[7]

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[8] STRESS-INDUCED EFFECTS IN SPUTTERING AND SURFACE ANALYSIS [J].

DEARNALEY, G .

APPLIED PHYSICS LETTERS, 1976, 28 (05) :244-245

[9] RANGE MEASUREMENTS IN ORIENTED TUNGSTEN SINGLE CRYSTALS (0.1-1.0 MEV) .I. ELECTRONIC AND NUCLEAR STOPPING POWERS [J].

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[10]

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