TEMPERATURE-DEPENDENT ABSORPTION PROCESSES IN THE XEF LASER

被引:18
作者
CHAMPAGNE, LF
机构
[1] Laser Physics Branch, Optical Sciences Division, Naval Research Laboratory, Washington
关键词
D O I
10.1063/1.91192
中图分类号
O59 [应用物理学];
学科分类号
摘要
Temperature-dependent absorption processes in neon/xenon/NF3 mixtures are reported. In pure neon plasmas there are two types of absorption present; a broad but weak band of absorption is observed, which increases with increasing temperature, and a strong narrow band of absorption is observed around 351 nm. Moderate heating reduces this absorption. Improved performance of the XeF laser at elevated temperature is primarily due to reduced absorption in the laser medium at 351 nm.
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页码:516 / 519
页数:4
相关论文
共 15 条
  • [1] HIGH-POWER XENON FLUORIDE LASER
    AULT, ER
    BRADFORD, RS
    BHAUMIK, ML
    [J]. APPLIED PHYSICS LETTERS, 1975, 27 (07) : 413 - 415
  • [2] XENON FLUORIDE LASER EXCITATION BY TRANSVERSE ELECTRIC-DISCHARGE
    BURNHAM, R
    HARRIS, NW
    DJEU, N
    [J]. APPLIED PHYSICS LETTERS, 1976, 28 (02) : 86 - 87
  • [3] INFLUENCE OF DILUENT GAS ON XEF LASER
    CHAMPAGNE, LF
    HARRIS, NW
    [J]. APPLIED PHYSICS LETTERS, 1977, 31 (08) : 513 - 515
  • [4] 1-MUS LASER-PULSES FROM XEF
    CHAMPAGNE, LF
    EDEN, JG
    HARRIS, NW
    DJEU, N
    SEARLES, SK
    [J]. APPLIED PHYSICS LETTERS, 1977, 30 (03) : 160 - 161
  • [5] CHAMPAGNE LF, UNPUBLISHED
  • [6] EFFICIENT XEF LASER-EXCITED BY A PROTON-BEAM
    EDEN, JG
    GOLDEN, J
    MAHATTEY, RA
    PASOUR, JA
    WAYNANT, RW
    [J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 133 - 136
  • [7] KINETICS SCHEME FOR XEF LASER
    FINN, TG
    PALUMBO, LJ
    CHAMPAGNE, LF
    [J]. APPLIED PHYSICS LETTERS, 1978, 33 (02) : 148 - 151
  • [8] INJECTION LOCKING OF A XENON FLUORIDE LASER
    GOLDHAR, J
    DICKIE, J
    BRADLEY, LP
    PLEASANCE, LD
    [J]. APPLIED PHYSICS LETTERS, 1977, 31 (10) : 677 - 679
  • [9] HSIA J, 1977, 30TH ANN GAS EL C PA
  • [10] IMPROVEMENT IN XEF LASER EFFICIENCY AT ELEVATED-TEMPERATURES
    HSIA, JC
    MANGANO, JA
    JACOB, JH
    ROKNI, M
    [J]. APPLIED PHYSICS LETTERS, 1979, 34 (03) : 208 - 210