LASER-ABLATION THRESHOLD OF YBA2CU3O6+X

被引：65

作者：

DAM, B

RECTOR, J

CHANG, MF

KARS, S

DEGROOT, DG

GRIESSEN, R

机构：

[1] Faculty of Physics and Astronomy, Free University, NL-1081 HV Amsterdam

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 12期

关键词：

D O I：

10.1063/1.112921

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Using projection optics we made a detailed study of the interaction of a spatially uniform 248 nm excimer laser beam and a 99% dense YBa2Cu3O6+x target. Below a threshold fluence of 1 J/cm2 the roughness of the irradiated target increases dramatically due to non-stoichiometric ablation. The overall target surface composition becomes increasingly Y rich and Cu poor, while the opposite is found for the corresponding ablated thin films. Above the threshold fluence the composition of the ablated target surface is conserved. As a result of the energy homogeneity of the laser beam obtained by means of projection optics, the optimization of the deposition parameters has been improved leading to the reproducible fabrication of flat, stoichiometric YBa2Cu3O7 films with T(c0)'s over 91 K.

引用

页码：1581 / 1583

页数：3

共 16 条

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