STEM/EDX microanalysis of compositional fluctuations in semiconductor multi-quantum-well structures

被引:10
作者
Bullock, JF
Titchmarsh, JM
Humphreys, CJ
机构
[1] Univ Oxford, Dept Met & Sci Mat, Oxford OX1 3PH, England
[2] AERE HArwell, Didcot OX11 0RA, Oxon, England
[3] Univ Liverpool, Dept Met & Mat Sci, Liverpool L69 3BX, Merseyside, England
关键词
D O I
10.1088/0268-1242/1/6/001
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Specimens of a GaAs/GaAIAs multiple-quantum-well structure grown by MOCVD have been examined in a scanning transmission electron microscope ( STEM) fitted with a field emission gun. Energy dispersive x-ray analysis has been used to identify chemical non-uniformities of about 1 nm in width, which can be seen in STEM imaging. Although accurate quantification is difficult, analysis has shown these features to be regions of increased AI concentration. These findings are consistent with results obtained by high-resolution electron microscopy with multi-slice image simulation.
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收藏
页码:343 / 345
页数:3
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