SIMPLE-MODEL OF THE DOSE DEPENDENCE OF RESISTANCE IN ION-BOMBARDED THIN-FILMS

被引:2
作者
BELSON, J
WILSON, IH
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D O I
10.1016/0040-6090(78)90074-3
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T [工业技术];
学科分类号
08 ;
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页码:61 / 66
页数:6
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Lindhard J., 1963, K DAN VID SELSK MAT, V33, P3
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[4]   CHANGES IN PHASE STRUCTURE AND FORMATION OF CHEMICAL COMPOUNDS BY ION-IMPLANTATION OF TANTALUM THIN-FILMS [J].
WILSON, IH ;
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