COSPUTTERED MOLYBDENUM SILICIDES ON THERMAL SIO2

[11] MURARKA SP, 1980, J APPL PHYS, V51, P1573

[12] MURARKA SP, 1979 IEEE IEDM TECHN, P454

[13] Neshpor V.S., 1960, FIZ TVERD TELA, V2, P2202

[14] SILICIDE FORMATION IN THIN MOLYBDENUM AND TUNGSTEN FILMS ON SINGLE-CRYSTAL SILICON SUBSTRATES AT RELATIVELY LOW-TEMPERATURES [J]. THIN SOLID FILMS, 1976, 37 (02) : 185 - 194

[15] POWELL WS, UNPUBLISHED

[16] ROBINS DA, 1958, PHILOS MAG, V8, P313

[17] SAH P, 1979 IEEE IEDM TECHN, P465

[18] THIN-FILM MO-SI INTERACTION [J]. APPLIED PHYSICS LETTERS, 1979, 34 (11) : 797 - 798

[19] Wehrmann R., 1967, HIGH TEMPERATURE MAT, P399

[11] MURARKA SP, 1980, J APPL PHYS, V51, P1573

[12] MURARKA SP, 1979 IEEE IEDM TECHN, P454

[13] Neshpor V.S., 1960, FIZ TVERD TELA, V2, P2202

[14] SILICIDE FORMATION IN THIN MOLYBDENUM AND TUNGSTEN FILMS ON SINGLE-CRYSTAL SILICON SUBSTRATES AT RELATIVELY LOW-TEMPERATURES [J]. THIN SOLID FILMS, 1976, 37 (02) : 185 - 194

[15] POWELL WS, UNPUBLISHED

[16] ROBINS DA, 1958, PHILOS MAG, V8, P313

[17] SAH P, 1979 IEEE IEDM TECHN, P465

[18] THIN-FILM MO-SI INTERACTION [J]. APPLIED PHYSICS LETTERS, 1979, 34 (11) : 797 - 798

[19] Wehrmann R., 1967, HIGH TEMPERATURE MAT, P399