SOFT LANDING OF IONS AS A MEANS OF SURFACE MODIFICATION

被引:132
作者
FRANCHETTI, V [1 ]
SOLKA, BH [1 ]
BAITINGER, WE [1 ]
AMY, JW [1 ]
COOKS, RG [1 ]
机构
[1] PURDUE UNIV,DEPT CHEM,W LAFAYETTE,IN 47907
来源
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES | 1977年 / 23卷 / 01期
关键词
D O I
10.1016/0020-7381(77)80004-1
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
引用
收藏
页码:29 / 35
页数:7
相关论文
共 12 条
  • [1] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .1. SYSTEM SPECIFICATION AND DESIGN
    AMANO, J
    BRYCE, P
    LAWSON, RPW
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (02): : 591 - 595
  • [2] Cho A. Y., 1975, Progress in Solid State Chemistry, V10, P157, DOI 10.1016/0079-6786(75)90005-9
  • [3] HALLAHAN JR, 1974, TECHNIQUES APPLICATI
  • [4] METAL-CARBONYL CHEMISTRY STUDIED WITH IMPLANTED IONS
    JENKINS, GM
    WILES, DR
    [J]. JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS, 1972, (21) : 1177 - &
  • [5] LALAU C, 1970, TOPICS ORGANIC MASS
  • [6] LEMMON RM, 1973, ACCOUNTS CHEM RES, V6, P65
  • [7] MAESSEL LI, 1970, HDB THIN FILM TECHNO
  • [8] HIGH INTENSITY LOW ENERGY SPREAD ION SOURCE FOR CHEMICAL ACCELERATORS
    MENZINGER, M
    WAHLIN, L
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (01) : 102 - +
  • [9] CHEMICALLY MODIFIED TIN OXIDE ELECTRODE
    MOSES, PR
    WIER, L
    MURRAY, RW
    [J]. ANALYTICAL CHEMISTRY, 1975, 47 (12) : 1882 - 1886
  • [10] NAMBA S, 1975, ADV ELECTRON ELECTRO, V37, P264