NON-EQUILIBRIUM EFFECTS ON METAL-OXIDE-SEMICONDUCTOR TUNNEL CURRENTS

被引:61
作者
CLARKE, RA
SHEWCHUN, J
机构
关键词
D O I
10.1016/0038-1101(71)90165-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:957 / &
相关论文
共 28 条
[11]  
GREY PV, 1965, PHYS REV, V140, P179
[12]   INVESTIGATION OF AL2O3 FILM-THICKNESS BY TUNNEL EMISSION AND CAPACITANCE MEASUREMENTS [J].
GUNDLACH, KH ;
HELDMANN, G .
SOLID STATE COMMUNICATIONS, 1967, 5 (11) :867-&
[13]   TUNNELING FROM AN INDEPENDENT-PARTICLE POINT OF VIEW [J].
HARRISON, WA .
PHYSICAL REVIEW, 1961, 123 (01) :85-&
[14]  
HEIMAN FP, THESIS PRINCETON
[15]   NON-EQUILIBRIUM C-V AND I-V CHARACTERISTICS OF METAL-INSULATOR-SEMICONDUCTOR CAPACITORS [J].
HIELSCHER, FH ;
PREIER, HM .
SOLID-STATE ELECTRONICS, 1969, 12 (07) :527-+
[18]   EFFECT OF NONUNIFORM THICKNESS OF INSULATING FILMS ON CAPACITANCE [J].
HURYCH, Z .
PHYSICA STATUS SOLIDI, 1965, 12 (02) :K97-&
[19]   CAPACITANCE OF THIN DIELECTRIC STRUCTURES [J].
KU, HY ;
ULLMAN, FG .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :265-&
[20]  
Pierret R. F., 1970, Solid-State Electronics, V13, P269, DOI 10.1016/0038-1101(70)90179-6