PREPARATION OF NA+-SELECTIVE ELECTRODES BY ION-IMPLANTATION OF LITHIUM AND SILICON INTO SINGLE-CRYSTAL ALUMINA WAFER AND ITS APPLICATION TO THE PRODUCTION OF ISFET

被引：30

作者：

SANADA, Y

AKIYAMA, T

UJIHIRA, Y

NIKI, E

机构：

[1] UNIV TOKYO,FAC ENGN,DEPT IND CHEM,BUNKYO KU,TOKYO 113,JAPAN

[2] INST VOCAT TRAINING,SAGAMIHARA,JAPAN

来源：

FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1982年 / 312卷 / 06期

关键词：

D O I：

10.1007/BF00636072

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：526 / 529

页数：4

共 8 条

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BERGVELD, P
[J]. IEEE TRANSACTIONS ON BIOMEDICAL ENGINEERING, 1970, BM17 (01) : 70 - &
[3] EISENMAN G, 1967, GLASS ELECTRODES HYD
[4] ION IMPLANTATION IN SEMICONDUCTORS .I. RANGE DISTRIBUTION THEORY AND EXPERIMENTS
GIBBONS, JF
[J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1968, 56 (03): : 295 - +
[5] THEORY AND APPLICATIONS OF ION-SELECTIVE ELECTRODES
KORYTA, J
[J]. ANALYTICA CHIMICA ACTA, 1972, 61 (03) : 329 - +
[6] Moody G. J., 1971, SELECTIVE ION SENSIT
[7] ION-SELECTIVE ELECTRODES
RECHNITZ, GA
[J]. CHEMICAL & ENGINEERING NEWS, 1967, 45 (25) : 146 - &
[8] SANADA Y, 1981, BUNSEKI KAGAKU, V30, P678