PREPARATION OF PBTIO3 THIN-FILMS AT LOW-TEMPERATURE BY AN EXCIMER LASER ABLATION TECHNIQUE

被引：91

作者：

TABATA, H ^{[1
]}

KAWAI, T ^{[1
]}

KAWAI, S ^{[1
]}

MURATA, O ^{[1
]}

FUJIOKA, J ^{[1
]}

MINAKATA, S ^{[1
]}

机构：

[1] KAWASAKI HEAVY IND CO LTD,INST TECH,AKASHI 673,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1991年 / 59卷 / 19期

关键词：

D O I：

10.1063/1.106038

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have formed PbTiO3 thin films on (100) SrTiO3 Substrates at a temperature of 350-degrees-C using an ArF excimer laser ablation technique. Until now, PbTiO3 films have not been formed at temperatures lower than 500-degrees-C using other thin-film techniques. The important points in the present study are the laser excitation of the substrate during the film growth and the lattice matching between the film and the substrate. The film deposited on the SrTiO3 substrate shows preferential orientation of the c-axis perpendicular to the substrate surface.

引用

页码：2354 / 2356

页数：3

共 8 条

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