INTERDEPENDENCE OF PARAMETERS IN REACTIVE SPUTTERING OF MANGANESE IN OXYGEN

被引：3

作者：

LOCKER, LD

VRATNY, F

NAEGELE, CL

LANDORF, RW

机构：

来源：

关键词：

D O I：

10.1149/1.2404157

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：183 / &

共 17 条

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[3] CAPIO CD, PRIVATE COMMUNICATIO
[4] CASH JH, 1966, J ELECTROCHEM SOC, V113, pC58
[5] GOSWAMI A, 1965, INDIAN J CHEM, V3, P285
[6] HAUFFE K, 1965, OXIDATION METALS, P272
[7] ELECTRICAL PROPERTIES OF MANGANESE DIOXIDE AND MANGANESE SESQUIOXIDE
KLOSE, PH
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (07) : 854 - &
[8] REDUCTION OF SUBSTRATE HEATING DURING RF SPUTTERING
LAMONT, LT
LANG, A
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (01): : 198 - &
[9] LANDORF RL, UNPUBLISHED DATA
[10] EFFECTS OF ADDED O2 UPON ARGON EMISSION FROM AN RF GLOW DISCHARGE
LOUNSBURY, JB
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (05): : 838 - +