VERY HARD W-C COATINGS ON STAINLESS-STEEL BY RF REACTIVE MAGNETRON SPUTTERING

被引:30
作者
SRIVASTAVA, PK [1 ]
VANKAR, VD [1 ]
CHOPRA, KL [1 ]
机构
[1] INDIAN INST TECHNOL,CTR MAT SCI & TECHNOL,NEW DELHI 110016,INDIA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 06期
关键词
D O I
10.1116/1.573685
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2819 / 2826
页数:8
相关论文
共 39 条
  • [1] ARCHER NJ, 1975, 5TH INT C CVD BUCK, P556
  • [2] MICROSTRUCTURAL EVALUATION OF CM 500L, A NEW W-C ALLOY COATING DEPOSITED BY THE CONTROLLED NUCLEATION THERMOCHEMICAL DEPOSITION PROCESS
    BHAT, DG
    HOLZL, RA
    [J]. THIN SOLID FILMS, 1982, 95 (02) : 105 - 112
  • [3] XPS STUDY OF THE ADHERENCE OF REFRACTORY CARBIDE, SILICIDE, AND BORIDE RF-SPUTTERED WEAR-RESISTANT COATINGS
    BRAINARD, WA
    WHEELER, DR
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (06): : 1800 - 1805
  • [4] FACTORS AFFECTING ADHERENCE OF CHEMICALLY VAPOR-DEPOSITED COATINGS
    BRYANT, WA
    MEIER, GH
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 719 - 724
  • [5] BRYANT WA, 1970, 2ND P INT C CHEM VAP, P409
  • [6] FEDERER JI, 1970, 2ND P INT C CHEM VAP, P591
  • [7] COATING OF CEMENTED CARBIDE CUTTING TOOLS WITH ALUMINA BY CHEMICAL VAPOR-DEPOSITION
    FUNK, R
    SCHACHNER, H
    TRIQUET, C
    KORNMANN, M
    LUX, B
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (02) : 285 - 289
  • [8] GLASK FA, 1973, 4TH P INT CVD C, P521
  • [9] THE SCRATCH TEST ADHESION OF TIC DEPOSITED INDUSTRIALLY BY CHEMICAL VAPOR-DEPOSITION ON STEEL
    HAMMER, B
    PERRY, AJ
    LAENG, P
    STEINMANN, PA
    [J]. THIN SOLID FILMS, 1982, 96 (01) : 45 - 51
  • [10] CHEMICAL VAPOR-DEPOSITION OF CHROMIUM
    HANNI, W
    HINTERMANN, HE
    [J]. THIN SOLID FILMS, 1977, 40 (JAN) : 107 - 114