LOW-TEMPERATURE HYSTERESIS EFFECTS IN METAL-OXIDE-SILICON CAPACITORS CAUSED BY SURFACE-STATE TRAPPING

被引:88
作者
GOETZBERGER, A
IRVIN, JC
机构
关键词
D O I
10.1109/T-ED.1968.16554
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1009 / +
页数:1
相关论文
共 14 条
[11]   CONDUCTIVITY AND HALL EFFECT IN THE INTRINSIC RANGE OF GERMANIUM [J].
MORIN, FJ ;
MAITA, JP .
PHYSICAL REVIEW, 1954, 94 (06) :1525-1529
[12]   LATERAL AC CURRENT FLOW MODEL FOR METAL-INSULATOR-SEMICONDUCTOR CAPACITORS [J].
NICOLLIAN, EH ;
GOETZBERGER, A .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1965, ED12 (03) :108-+
[13]   STATISTICS OF THE RECOMBINATIONS OF HOLES AND ELECTRONS [J].
SHOCKLEY, W ;
READ, WT .
PHYSICAL REVIEW, 1952, 87 (05) :835-842
[14]  
[No title captured]