PREPARATION AND ELECTRICAL-PROPERTIES OF MOCVD-DEPOSITED PZT THIN-FILMS

被引:128
作者
SAKASHITA, Y [1 ]
ONO, T [1 ]
SEGAWA, H [1 ]
TOMINAGA, K [1 ]
OKADA, M [1 ]
机构
[1] CHUBU UNIV, FAC ENGN, KASUGAI, AICHI 487, JAPAN
关键词
D O I
10.1063/1.347397
中图分类号
O59 [应用物理学];
学科分类号
摘要
Strongly [001] oriented lead zirconate-titanate [Pb(Zr(x)Ti1-x)O3] thin films with tetragonal structure (0 < x < 0.52) have been successfully grown on (100)Pt/(100)MgO substrates by using metalorganic chemical vapor deposition (MOCVD). The metalorganic precursors were Pb(C2H5)4, Zr(DPM)4 and Ti(i-OC3H7)4. Scanning electron micrographs showed dense and noncolumnar growth with good surface morphology. The relative dielectric constants at room temperature were 200-350, and appeared to have less dependence on composition x than for PZT bulk ceramics. Typical D-E hysteresis loops which occur with PZT bulk ceramics were observed. Remanent polarizations were 30-40-mu-C/cm2. The coercive field decreased from 65 to 40 kV/cm with increases in Zr content. The pyroelectric coefficients without poling treatment were about 3 X 10(-8) C/cm2 K, showing almost the same value as that of poled PZT bulk ceramics.
引用
收藏
页码:8352 / 8357
页数:6
相关论文
共 18 条