AEROSOL-ASSISTED CHEMICAL-VAPOR-DEPOSITION (AACVD) OF SILVER, PALLADIUM AND METAL ALLOY (AG1-XPDX, AG1-XCUX AND PD1-XCUX) FILMS

被引：40

作者：

XU, CY ^{[1
]}

HAMPDENSMITH, MJ ^{[1
]}

KODAS, TT ^{[1
]}

机构：

[1] UNIV NEW MEXICO,DEPT CHEM ENGN,ALBUQUERQUE,NM 87131

来源：

ADVANCED MATERIALS | 1994年 / 6卷 / 10期

关键词：

D O I：

10.1002/adma.19940061005

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Thermally labile, low-volatility molecules are usually unsuitable as precursors for the chemical vapor deposition of high-quality metal films. Here, a new method, aerosol-assisted CVD (see Fig.), is reported, and used to produce crystalline silver, palladium, and binary metal alloy thin films from just such precursors.

引用

页码：746 / 748

页数：3

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