INTERPRETATION OF SCANNING HIGH-ENERGY ELECTRON-DIFFRACTION MEASUREMENTS WITH APPLICATION TO GAAS SURFACES

被引：16

作者：

DOVE, DB ^{[1
]}

LUDEKE, R ^{[1
]}

CHANG, LL ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 04期

关键词：

D O I：

10.1063/1.1662472

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1897 / 1899

页数：3

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