MORPHOLOGY OF EPITAXIAL GROWTH OF GAAS BY A MOLECULAR BEAM METHOD - OBSERVATION OF SURFACE STRUCTURES

被引:261
作者
CHO, AY
机构
关键词
D O I
10.1063/1.1659315
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:2780 / &
相关论文
共 23 条
[1]   SURFACE PROCESSES IN GROWTH SILICON ON (111)SILICON IN ULTRAHIGH VACUUM [J].
ABBINK, HC ;
BROUDY, RM ;
MCCARTHY, GP .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (10) :4673-&
[2]   VAPOR PRESSURES AND PHASE EQUILIBRIA IN GA-AS SYSTEM [J].
ARTHUR, JR .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1967, 28 (11) :2257-&
[3]  
ARTHUR JR, UNPUBLISHED
[4]  
ARTHUR JR, 1969, P C STRUCTURE CHEM S, P46
[5]  
BAUER E, 1969, TECHNIQUE DIRECT O 2, P502
[7]   EPITAXY BY PERIODIC ANNEALING [J].
CHO, AY .
SURFACE SCIENCE, 1969, 17 (02) :494-&
[8]   EPITAXIAL GROWTH AND OPTICAL EVALUATION OF GALLIUM PHOSPHIDE AND GALLIUM ARSENIDE THIN FILMS ON CALCIUM FLUORIDE SUBSTRATE [J].
CHO, AY ;
CHEN, YS .
SOLID STATE COMMUNICATIONS, 1970, 8 (06) :377-&
[9]   EPITAXIAL GAAS FILMS DEPOSITED BY VACUUM EVAPORATION [J].
DAVEY, JE ;
PANKEY, T .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (04) :1941-&
[10]   ON NATURE OF SI(111) SURFACES [J].
GRANT, JT ;
HAAS, TW .
APPLIED PHYSICS LETTERS, 1969, 15 (05) :140-&