USE OF THIN FILMS IN DETERMINING FUNDAMENTAL OPTICAL PROPERTIES OF SEMICONDUCTORS

被引：3

作者：

PAUL, W

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.1315662

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：483 / &

共 37 条

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[3]

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HARBEKE, G .

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[7] REACTIVELY SPUTTERED VANADIUM DIOXIDE THIN FILMS [J].

FULS, EN ;

HENSLER, DH ;

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APPLIED PHYSICS LETTERS, 1967, 10 (07) :199-&

[8] OPTICAL PROPERTIES OF THIN GERMANIUM FILMS IN WAVELENGTH RANGE 2000-6000 A [J].

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PAUL, W .

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[9]

GRANT PM, 1965, HP14 HARV U TECH REP

[10]

GRANT PM, TO BE PUBLISHED

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