THERMAL-STABILITY OF PD2SI AND PDSI IN THIN-FILM AND IN BULK DIFFUSION COUPLES

被引：30

作者：

TU, KN

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 01期

关键词：

D O I：

10.1063/1.329905

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：428 / 432

页数：5

共 12 条

[1]

BAGLIN JEE, 1980, P S THIN FILM INTERF

[2]

Christian J. W., 2002, THEORY TRANSFORMATIO, V3rd

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SHEPELA, A .

THIN SOLID FILMS, 1973, 18 (02) :343-363

[4] HEAT OF FORMATION OF SOLID ALLOYS [J].

MIEDEMA, AR ;

BOOM, R ;

DEBOER, FR .

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[5] ELECTRONEGATIVITY PARAMETER FOR TRANSITION-METALS - HEAT OF FORMATION AND CHARGE-TRANSFER IN ALLOYS [J].

MIEDEMA, AR .

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[6]

MOFFATT HB, 1976, BINARY PHASE DIAGRAM

[7] INTERFACIAL REACTION AND SCHOTTKY-BARRIER IN METAL-SILICON SYSTEMS [J].

OTTAVIANI, G ;

TU, KN ;

MAYER, JW .

PHYSICAL REVIEW LETTERS, 1980, 44 (04) :284-287

[8] REVERSIBLE PHASE-TRANSFORMATION IN THE PD2SI-PDSI THIN-FILM SYSTEM [J].

TSAUR, BY ;

NICOLET, MA .

APPLIED PHYSICS LETTERS, 1980, 37 (08) :708-711

[9]

TU KN, 1978, THIN FILMS INTERDIFF, pCH10

[10]

TURNBULL D, 1956, SOLID STATE PHYS, V3, P225

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