ROLE OF ARGON INVOLVED IN PLASMA-DEPOSITED AMORPHOUS SI-H FILMS

被引:41
作者
TANAKA, K
YAMASAKI, S
NAKAGAWA, K
MATSUDA, A
OKUSHI, H
MATSUMURA, M
IIZIMA, S
机构
关键词
D O I
10.1016/0022-3093(80)90640-7
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:475 / 480
页数:6
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