SPUTTERING OF BE AND BEO BY LIGHT-IONS

被引：23

作者：

ROTH, J ^{[1
]}

BOHDANSKY, J ^{[1
]}

BLEWER, RS ^{[1
]}

OTTENBERGER, W ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87185

来源：

JOURNAL OF NUCLEAR MATERIALS | 1979年 / 85-6卷 / DEC期

关键词：

D O I：

10.1016/0022-3115(79)90402-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Sputtering yields of Be and BeO using 50 eV to 8 keV H+, D+ and He+ ions are reported. The measurements were made by determining the weight loss of the samples using a microbalance with with sub-microgram sensitivity. Zone melted Be and sintered BeO targets were used. For the oxide measurements, the surface charge was compensated by electrons emitted from a hot tungsten filament. The energy dependence of the sputtering yield for both Be and BeO shows a maximum near 1 keV and a sharp decrease to lower energies. The results are discussed in terms of a scaling rule for low energy ion sputtering developed recently[1]. © 1979.

引用

页码：1077 / 1079

页数：3

共 8 条

[1] LIGHT-ION SPUTTERING YIELDS FOR MOLYBDENUM AND GOLD AT LOW ENERGIES [J].