EFFECT OF BORON INCORPORATION ON THE QUALITY OF MPCVD DIAMOND FILMS

被引:93
作者
GHEERAERT, E
GONON, P
DENEUVILLE, A
ABELLO, L
LUCAZEAU, G
机构
[1] CNRS,ETUD PROPRIETES ELECTR SOLIDES LAB,BP 166,F-38042 GRENOBLE 9,FRANCE
[2] ENSEEG,ION & ELECTR SOLIDE LAB,F-38041 GRENOBLE,FRANCE
关键词
D O I
10.1016/0925-9635(93)90215-N
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report the morphology and Raman signals of MPCVD (microwave-plasma-assisted chemical vapour deposition) boron-doped diamond films deposited on Si with a B:C ratio in the gas phase ranging from 20 to 10 000 ppm. The crystal shape remains cubo-octahedral in the whole range of doping, while the growth rate is reduced as B:C increases. Up to B:C = 400 ppm the full width at half-maximum (FWHM) and a very weak 1500 cm-1 component decrease as the B:C ratio increases. From B:C = 1000 ppm, an asymmetric deformation is observed in the Raman spectra and at the same time the FWHM and the 1500 cm-1 component increase with increasing B:C. For the highest B:C ratio of 10000 ppm additional bands appear around 550 and 1220 cm-1.
引用
收藏
页码:742 / 745
页数:4
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