CHARACTERIZATION OF FILAMENT-ASSISTED CHEMICAL VAPOR-DEPOSITION DIAMOND FILMS USING RAMAN-SPECTROSCOPY

被引：121

作者：

BUCKLEY, RG ^{[1
]}

MOUSTAKAS, TD ^{[1
]}

LING, Y ^{[1
]}

VARON, J ^{[1
]}

机构：

[1] EXXON RES & ENGN CO, ANNANDALE, NJ 08801 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 08期

关键词：

D O I：

10.1063/1.344065

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：3595 / 3599

页数：5

相关论文

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