PHOTOCHEMICAL FORMATION OF FREE RADICALS FROM HYDROGEN SULFIDE MERCAPTANS AND CYSTEINE

被引：29

作者：

VOLMAN, DH

WOLSTENHOLME, J

HADLEY, SG

机构：

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1967年 / 71卷 / 06期

关键词：

D O I：

10.1021/j100865a037

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

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页码：1798 / +

页数：1

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