INTERNAL STRESSES AND RESISTIVITY OF LOW-VOLTAGE SPUTTERED TUNGSTEN FILMS

被引：69

作者：

SUN, RC ^{[1
]}

TISONE, TC ^{[1
]}

CRUZAN, PD ^{[1
]}

机构：

[1] BELL TEL LABS,ALLENTOWN,PA 18103

来源：

关键词：

D O I：

10.1063/1.1662297

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1009 / 1016

页数：8

共 22 条

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[2] AN ELECTRICAL RESISTIVITY STUDY OF DEFORMATION AND RECOVERY OF IRON AT LOW TEMPERATURE
CUDDY, LJ
[J]. PHILOSOPHICAL MAGAZINE, 1965, 12 (118): : 855 - &
[3] CULLITY BD, 1956, ELEMENTS XRAY DIFFRA, P436
[4] FERMI SURFACE AREAS OF CHROMIUM, MOLYBDENUM AND TUNGSTEN
FAWCETT, E
GRIFFITHS, D
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1962, 23 (11) : 1631 - &
[5] GEBHARDT F, 1958, Z METALLKD, V49, P577
[6] GISEN F, 1936, Z TECH PHYS, V17, P145
[7] Glang LI, 1970, HDB THIN FILM TECHNO, P4
[8] GLANG R, 1965, ADVANCES VACUUM SC 3, V2, P643
[9] KLUG HP, 1954, XRAY DIFFRACTION PRO, P512
[10] Koistinen D.P., 1959, T ASM, V51, P537