QUANTITATIVE STUDY OF THE HYDROXYLATION AND OF THE CHEMICAL GRAFTING OF OXIDIZED POROUS SILICON

被引：18

作者：

DUVAULTHERRERA, Y ^{[1
]}

JAFFREZICRENAULT, N ^{[1
]}

CLECHET, P ^{[1
]}

SERPINET, J ^{[1
]}

MOREL, D ^{[1
]}

机构：

[1] UNIV LYON 1,SCI ANALYT LAB,CNRS,URA 474,F-69622 VILLEURBANNE,FRANCE

来源：

COLLOIDS AND SURFACES | 1990年 / 50卷

关键词：

Silanes--Grafting - Surfaces--Chemical Modification;

D O I：

10.1016/0166-6622(90)80263-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A porous silica layer was obtained by anodic dissolution of silicon and thermal oxidation. The initial porous structure of silicon is preserved after well defined oxidation treatments. The silica layer was hydrated and chemically modified by grafting bromohexyl silane. The adaptation of different analytical methods allows the determination of the silanol and the graft densities. The experimental conditions for obtaining the highest densities were defined. These results will be applied to the preparation of ion sensitive membranes for ISFET. © 1990.

引用

页码：197 / 206

页数：10

共 20 条

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