FABRICATION OF SURFACES RESISTANT TO PROTEIN ADSORPTION AND APPLICATION TO 2-DIMENSIONAL PROTEIN PATTERNING

被引:96
作者
BHATIA, SK
TEIXEIRA, JL
ANDERSON, M
SHRIVERLAKE, LC
CALVERT, JM
GEORGER, JH
HICKMAN, JJ
DULCEY, CS
SCHOEN, PE
LIGLER, FS
机构
[1] USN,RES LAB,CTR BIOMOLEC SCI & ENGN,CODE 6900,WASHINGTON,DC 20375
[2] GEOCENTERS INC,FT WASHINGTON,MD 20744
[3] SCI APPLICAT INT CORP,MCLEAN,VA 22102
关键词
D O I
10.1006/abio.1993.1027
中图分类号
Q5 [生物化学];
学科分类号
071010 ; 081704 ;
摘要
Proteins were attached in defined geometric patterns on a surface. A prerequisite to making a pattern of proteins is generation of surfaces resistant to nonspecific protein adsorption. This was accomplished via oxidation of the thiol terminus of an organosilane self-assembled monolayer film by deep ultraviolet (DUV) irradiation. The resultant surface exhibited marked resistance to protein adsorption. Using a mask to protect regions of the silanized surface from irradiation, proteins were selectively adsorbed or attached via covalent linkage at locations protected from the DUV light. Antibodies immobilized in patterns using this procedure retained their antigen-binding capability. Thus chemistry and DUV lithography were combined to create patterns of active biomolecules which could be used in the microfabrication of electronic devices and biosensors. © 1994 Academic Press, Inc. All rights reserved.
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页码:197 / 205
页数:9
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