ELECTRICAL-CONDUCTIVITY, DEFECT DENSITY AND STRUCTURE OF OBLIQUELY VACUUM-DEPOSITED TIN ANTIMONIDE ALLOY THIN-FILMS

被引：1

作者：

DAS, VD

JAGADEESH, MS

机构：

来源：

JOURNAL OF MATERIALS SCIENCE | 1982年 / 17卷 / 03期

关键词：

D O I：

10.1007/BF00540363

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：671 / 676

页数：6

共 17 条

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[4]

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[10] THICKNESS DEPENDENCE OF DEFECT DENSITY IN SILVER FILMS [J].

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