ELECTRONIC-STRUCTURES OF SI-BASED MANMADE CRYSTALS

被引:16
作者
SUGAHARA, S
SUGIURA, O
MATSUMURA, M
机构
[1] Department of Physical Electronics, Tokyo Institute of Technology, Oh-okayama, Tokyo
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 1B期
关键词
MANMADE CRYSTAL; ELECTRONIC STRUCTURE; SI; GE; DIRECT SEMICONDUCTOR; DEEP LEVEL;
D O I
10.1143/JJAP.32.384
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electronic structures have been calculated for Si-based manmade crystals with homogeneous strain using a tight-binding sp3s* model. Interesting properties, such as direct transition and pseudonarrow bandgap, appear especially in crystals where two monolayers of non-Si atoms are stacked in many layers of Si atoms along the (111) orientation.
引用
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页码:384 / 388
页数:5
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